A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers.
نویسندگان
چکیده
A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.
منابع مشابه
Pore Narrowing of Mesoporous Silica Materials
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ورودعنوان ژورنال:
- Chemical communications
دوره 48 22 شماره
صفحات -
تاریخ انتشار 2012